Suchergebnisse
Suchergebnisse:
Vor einem Tag · Thin films of silica grow spontaneously on silicon wafers via thermal oxidation, producing a very shallow layer of about 1 nm or 10 Å of so-called native oxide. Higher temperatures and alternative environments are used to grow well-controlled layers of silicon dioxide on silicon, for example at temperatures between 600 and 1200 °C, using so-called dry oxidation with O 2
